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ITO patterning, laser etching, ITO removing, indium tin oxides etching
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Categories: Solutions » Laser Etching »
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Description:
Min etching line width: 20um
Etching area: 500*500mm
ITO single layer and double layer etching, other coating film etching, such as Ag, Al, Si removing
Precision: +/-10um
Alignment: 5um
Any patterns of CAD output
Application: touch panel, OLED, solar cell, electronics,etc
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ITO patterning, laser etching, ITO removing, indium tin oxides etching Manufacturer,Supplier&Factory Manufacturer search on:Google, Yahoo, Msn
Related Category: Solutions » Laser Etching »
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