ITO patterning, laser etching, ITO removing, indium tin oxides etching

Min etching line width:  20um

Etching area: 500*500mm

ITO single layer and double layer etching, other coating film etching, such as Ag, Al, Si removing

Precision: +/-10um

Alignment: 5um

Any patterns of CAD output

Application: touch panel, OLED, solar cell, electronics,etc